- All sections
- H - Electricity
- H05H - Plasma technique; production of accelerated electrically- charged particles or of neutrons; production or acceleration of neutral molecular or atomic beams
- H05H 1/46 - Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Patent holdings for IPC class H05H 1/46
Total number of patents in this class: 2688
10-year publication summary
|
202
|
172
|
195
|
191
|
263
|
226
|
179
|
146
|
172
|
87
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 11599 |
572 |
| Applied Materials, Inc. | 16587 |
193 |
| Lam Research Corporation | 4775 |
98 |
| Nissin Electric Co., Ltd. | 213 |
54 |
| ULVAC, Inc. | 1448 |
46 |
| Tohoku University | 2526 |
41 |
| Hitachi Kokusai Electric Inc. | 1070 |
33 |
| Canon Anelva Corporation | 676 |
30 |
| Kokusai Electric Corporation | 1791 |
29 |
| Advanced Energy Industries, Inc. | 403 |
28 |
| Kyosan Electric Mfg. Co., Ltd. | 167 |
28 |
| MKS Instruments, Inc. | 698 |
28 |
| AES Global Holdings, Pte. Ltd. | 139 |
25 |
| Hitachi High-Tech Corporation | 4424 |
25 |
| National University Corporation Nagoya University | 921 |
22 |
| Sharp Kabushiki Kaisha | 18957 |
21 |
| Shimadzu Corporation | 5791 |
18 |
| Plasmology4, Inc. | 46 |
17 |
| Daihen Corporation | 435 |
16 |
| EMD Corporation | 26 |
16 |
| Other owners | 1348 |